AVS 64th International Symposium & Exhibition | |
Surface Science Division | Thursday Sessions |
Session SS+AS+EM-ThA |
Session: | Semiconductor Surfaces |
Presenter: | Shogo Uehara, SAMCO Inc. |
Authors: | S. Uehara, SAMCO Inc. T. Sugawara, SAMCO Inc. P. Wood, SAMCO Inc. |
Correspondent: | Click to Email |
UV-ozone treatment provides an atomic oxygen chemical reaction, where oxygen radicals are produced by UV-induced or thermal dissociation of ozone. Previously, it was found that ozone flux and stage temperature were critical for wettability improvement of polymer substrates such as polyetheretherketone (PEEK) [1]. However, in that study, the effects of UV irradiation, temperature, and oxygen radical flux were not clearly distinguished. In this research, a cave structure was employed to better elucidate the reaction mechanisms of UV irradiation, substrate temperature, and radical flux in UV-ozone treatment.
Polyimide-coated and photoresist-coated silicon coupons (5 mm x 5 mm) were placed at various depths inside a straight aluminum cave (6 mm x 6 mm square and 96 mm maximum depth). A SAMCO model UV-2 was used for this study. This system employs a cold cathode, mercury vapor UV lamp (185 nm and 254 nm), a remote (ex-situ) silent discharge high-concentration ozone generator (30-160 g/m3) and sample stage heating (50 to 200°C). The surface wettability of polyimide was examined using the water contact angle, and the photoresist ashing rate was measured using a stylus profilometer (Ambios Technology, XP-200).
Generally, samples placed at higher aspect ratios showed higher contact angles and lower ashing rates. This indicated that the reactive species were deactivated or did not reach the sample when the aspect ratio became larger (i.e. the depth of the sample in the cave became greater). At an aspect ratio of 15, with ex-situ ozone only (no UV irradiation) and a stage temperature of 100°C, the polyimide samples did not show a significant ashing rate or contact angle decrease. However, at 200°C, the samples processed with ex-situ ozone only (no UV irradiation) showed contact angle of 15.40° against the initial value of 93.70° and an ashing rate of 9.95 nm/min. The samples processed using UV irradiation with ex-situ ozone at 200°C showed a contact angle of 75.93° and an ashing rate of 7.67 nm/min.
From these results, it was concluded that production of oxygen radicals was accelerated by thermal dissociation of ozone at the higher temperature. The oxygen radical flux produced at high temperature gradually decreased in the cave as the aspect ratio became greater, but it remained relatively high and caused temperature-driven surface chemical reactions. It was postulated that the 254 nm UV irradiation dissociated ozone that otherwise would have reached deep inside the cave and thermally dissociated [2].
[1] Uehara, S., Kawabe, T., Wood, P., & Tsuji, O. (2016). MRS Advances, 1.11, 743-748.
[2] Wood, P., Wydeven, T., & Tsuji, O. (1993). MRS Proceedings, 315. 237.