AVS 64th International Symposium & Exhibition
    Electronic Materials and Photonics Division Thursday Sessions
       Session EM-ThP

Paper EM-ThP8
Design and Synthesis of Precursors for Photoassisted Chemical Vapor Deposition

Thursday, November 2, 2017, 6:30 pm, Room Central Hall

Session: Electronic Materials and Photonics Poster Session
Presenter: Christopher Brewer, University of Florida
Authors: C. Brewer, University of Florida
O. Hawkins, University of Florida
B. Salazar, University of Texas at Dallas
A.V. Walker, University of Texas at Dallas
L. McElwee-White, University of Florida
Correspondent: Click to Email
Chemical vapor deposition (CVD) is a potentially attractive technique for the metallization of organic thin films. However, thermal CVD processes often require high temperatures which are incompatible with organic substrates. Photochemistry provides an alternative means of initiating precursor decomposition without heating the substrate. Readily available Ru precursors, including (η3-allyl)Ru(CO)3X and CpRu(CO)2X (X = Cl, Br, I), have been used to deposit Ru on functionalized self-assembled monolayers (SAMs) by means of photochemical CVD as a model system for deposition of metal on a thermally sensitive substrate. Carboxylic acid-, hydroxyl- and methyl-terminated SAMs were used to explore the effects of surface functionality on deposition and the presence of Ru on the SAMs was confirmed by HR TOF SIMS. Preliminary experiments have shown that an attractive precursor for photoassisted CVD will be volatile, have an acid sensitive functionality and have a reasonable quantum yield for ligand loss. Synthesis of the precursors, determination of the quantum yields and deposition of Ru onto the functionalized SAMs will be discussed.