| AVS 64th International Symposium & Exhibition | |
| Applied Surface Science Division | Wednesday Sessions |
| Session AS+2D+NS+SA-WeA |
| Session: | 2D, 3D and nD Imaging of Surfaces, Buried Interfaces and Nanostructures |
| Presenter: | Michaeleen Pacholski, The Dow Chemical Company |
| Authors: | M.L. Pacholski, The Dow Chemical Company Z. Qu, The Dow Chemical Company W. Ouyang, The Dow Chemical Company |
| Correspondent: | Click to Email |