| AVS 62nd International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+EM+NS+PS+SM-ThM1 Invited Paper Atomic Layer Deposition of Silicon Dielectrics: Precursors, Processes, and Plasmas Dennis Hausmann, Lam Research Corporation |
| 8:40am | TF+EM+NS+PS+SM-ThM3 Invited Paper ALD Dielectrics for Power Electronics Veena Misra, NCSU |
| 9:20am | TF+EM+NS+PS+SM-ThM5 Pb(ZrxTi1-x)O3 Magnetoelectric Tunnel Junctions for Magnetoelectric RAM (MeRAM) Memory Applications D. Chien, X. Li, K. Wong, P. Khalili, K. Wang, Jane P. Chang, University of California at Los Angeles |
| 9:40am | TF+EM+NS+PS+SM-ThM6 Plasma-Assisted ALD of High-Quality Molybdenum Oxide Films Martijn Vos, B. Macco, N.F.W. Thissen, A.A. Bol, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 11:00am | TF+EM+NS+PS+SM-ThM10 Invited Paper Status and Prospects of Plasma-Assisted Atomic Layer Deposition Harm Knoops, Oxford Instruments Plasma Technology, UK, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 11:40am | TF+EM+NS+PS+SM-ThM12 A Novel Plasma-Enhanced ALD Process for HfO2 using HfCp(NMe2)3 and O2 Plasma Akhil Sharma, V. Longo, A.A. Bol, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 12:00pm | TF+EM+NS+PS+SM-ThM13 Conductive Hafnium Nitride Layers By Plasma-Assisted Atomic Layer Deposition Saurabh Karwal, B.L. Williams, W.M.M. Kessels, M. Creatore, Eindhoven University of Technology, The Netherlands |