| AVS 62nd International Symposium & Exhibition | |
| Selective Deposition as an Enabler of Self-Alignment Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SD+AS+EM-ThM1 Fundamental Examinations of Surface Chemistry-Driven Approaches to Selective Area Atomic Layer Deposition W. Zhang, J.-R. Chen, James Engstrom, Cornell University |
| 8:20am | SD+AS+EM-ThM2 Mechanistic Understanding of Surface-Selective Chemical Vapor Deposition of Copper Films Using a Molecular Inhibitor Elham Mohimi, S. Babar, B. Trinh, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana Champaign |
| 8:40am | SD+AS+EM-ThM3 Invited Paper Selective Deposition of Copper-Manganese Alloy for Interconnects Roy Gordon, Harvard University |
| 9:20am | SD+AS+EM-ThM5 Invited Paper Selective Growth of First Row Transition Metal Films by Atomic Layer Deposition Charles Winter, Wayne State University |
| 11:00am | SD+AS+EM-ThM10 Etching and Chemical Functionalization of Silicon Nitride Surfaces for Selective Deposition L.-H. Liu, T. Peixoto, W. Cabrera, D. Dick, J.-F. Veyan, University of Texas at Dallas, D.J. Michalak, R. Hourani, Intel Corporation, M.D. Halls, Schrodinger, Inc., S.P. Pujar, H. Zuilhof, Wageningen University, Netherlands, Yves J. Chabal, University of Texas at Dallas |
| 11:20am | SD+AS+EM-ThM11 Area Selective Deposition of Ultrathin Magnetic Cobalt Films via Atomic Layer Deposition John Ekerdt, H. Nallan, T. Ngo, S. Chopra, Z. Zhang, University of Texas at Austin |
| 11:40am | SD+AS+EM-ThM12 Area-Selective Al2O3 Pattern Grown by Atomic Layer Deposition Seunggi Seo, H. Jung, I.K. Oh, H. Kim, Yonsei University, Republic of Korea, J. Yoon, C. Yoo, H.-J. Kim, Y.-B. Lee, LG Display Co., Ltd., Republic of Korea |