| AVS 62nd International Symposium & Exhibition | |
| Electronic Materials and Processing | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | EM-ThM1 Invited Paper John A. Thornton Memorial Award Lecture - PECVD Low and Ultralow Dielectric Constant Materials: From Invention and Research to Products Alfred Grill, IBM Research Division, T.J. Watson Research Center |
| 8:40am | EM-ThM3 Moving Across the Periodic Table: Amorphous Hydrogenated Boron Carbide for Low-k Dielectric Applications Michelle Paquette, B.J. Nordell, T.D. Nguyen, S.S. Purohit, A.N. Caruso, University of Missouri-Kansas City, W.A. Lanford, University at Albany-SUNY, P. Henry, S.W. King, Intel Corporation |
| 9:00am | EM-ThM4 Enhancing Mechanical and Fracture Properties of ULK Materials with Filled Pores S.G. Isaacson, Stanford University, K. Lionti, W. Volksen, T.P. Magbitang, IBM Almaden Research Center, Reinhold Dauskardt, Stanford University, G. Dubois, IBM Almaden Research Center |
| 9:20am | EM-ThM5 Invited Paper Status Update on a New Class of Solution Processable Low-k Dielectric Coatings for Use as ILD with K < 2.4 Hash Pakbaz, N. Hacker, SBA Materials, Z. Tokei, M. Baklanov, IMEC, KU Leuven Belgium |
| 11:00am | EM-ThM10 The Effect of Vacuum Ultraviolet Irradiation on TDDB of Low-K Dielectrics using Synchrotron Radiation Dongfei Pei, M. Nichols, University of Wisconsin-Madison, S.W. King, J. Clarke, Intel Corporation, Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
| 11:20am | EM-ThM11 Influence of Porosity on VUV Induced Damage to Low-K Dielectrics Faraz Choudhury, University of Wisconsin-Madison, J.-F. de Marneffe, M. Baklanov, IMEC, Belgium, S.W. King, Intel Corporation, Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
| 11:40am | EM-ThM12 An Electron Paramagnetic Resonance Study of Processing Effects in Porous Low-κ Dielectrics Michael Mutch, P.M. Lenahan, Pennsylvania State University, S.W. King, Intel Corporation |
| 12:00pm | EM-ThM13 The Effects of VUV Radiation on Low-k Organosilicate Glass (SiCOH) as Measured with Electron-Spin Resonance Panpan Xue, H. Zheng, W. Li, University of Wisconsin-Madison, J.-F. de Marneffe, IMEC, M. Baklanov, IMEC, Belgium, V. Afanas'ev, Catholic University of Leuven, Belgium, Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |