AVS 62nd International Symposium & Exhibition | |
2D Materials Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | 2D+EM+NS+PS+SP+SS+TF-MoM1 Growth and FTIR Characterization of 2D Hexagonal Boron Nitride on Metal Substrates Boris Feigelson, V.M. Bermudez, J.K. Hite, Z.R. Robinson, V.D. Wheeler, K. Sridhara, S.C. Hernández, US Naval Research Laboratory |
8:40am | 2D+EM+NS+PS+SP+SS+TF-MoM2 Effect of Surface Termination on the Growth of Graphene on Cu Single Crystal Substrates Tyler Mowll, E.W. Ong, University at Albany-SUNY, P. Tyagi, GLOBALFOUNDRIES, Z.R. Robinson, College at Brockport-SUNY, C.A. Ventrice, Jr., SUNY Polytechnic Institute |
9:00am | 2D+EM+NS+PS+SP+SS+TF-MoM3 Thermally Annealed and Electropolished Cu Substrates for CVD Growth of 2D Materials: Graphene, h-BN and MoS2 Karthik Sridhara, Texas A&M University, B.N. Feigelson, J.K. Hite, US Naval Research Laboratory, A. Nath, George Mason University, M. Fuhrer, Monash University, Australia, D.K. Gaskill, US Naval Research Laboratory, H. Castaneda, L.O. Nyakiti, Texas A&M University |
9:20am | 2D+EM+NS+PS+SP+SS+TF-MoM4 In Situ Optical Diagnostics During Molybdenum Disulfide Chemical Vapor Deposition Berc Kalanyan, J.E. Maslar, W.A. Kimes, B.A. Sperling, National Institute of Standards and Technology (NIST), R. Tieckelmann, T. Orzali, SEMATECH, R. Beams, S.J. Stranick, A.V. Davydov, National Institute of Standards and Technology (NIST) |
9:40am | 2D+EM+NS+PS+SP+SS+TF-MoM5 Invited Paper Controlled Interfaces in 2D Materials Arend van der Zande, University of Illinois at Urbana Champaign |
10:40am | 2D+EM+NS+PS+SP+SS+TF-MoM8 Obtaining Clean Suspended CVD Graphene: Comparative Examination of Few Transfer and Cleaning Protocols Alexander Yulaev, National Institute of Standards and Technology (NIST), University of Maryland (UMD), G. Cheng, A. Hight Walker, National Institute of Standards and Technology (NIST), M. Leite, University of Maryland (UMD), A. Kolmakov, NIST |
11:00am | 2D+EM+NS+PS+SP+SS+TF-MoM9 Low-Energy Electron Microscopy of Transition Metal Dichalcogenides Prepared by Various Methods Sergio de la Barrera, S. Satpathy, R. Feenstra, Carnegie Mellon University, S. Wu, X.D. Xu, University of Washington, S. Vishwanath, X. Liu, J. Furdyna, D. Jena, H. Xing, University of Notre Dame, Y.-C. Lin, S.M. Eichfeld, J.A. Robinson, Pennsylvania State University, P. Mende, Carnegie Mellon University |
11:20am | 2D+EM+NS+PS+SP+SS+TF-MoM10 Invited Paper Atomically-Thin 2D Layers of Group IV Semiconductors Joshua Goldberger, The Ohio State University |