| AVS 62nd International Symposium & Exhibition | |
| Vacuum Technology | Wednesday Sessions |
| Session VT-WeM |
| Session: | Accelerator and Large Vacuum Systems |
| Presenter: | Freek Molkenboer, TNO Technical Sciences, Netherlands |
| Authors: | F.T. Molkenboer, TNO Technical Sciences, Netherlands N.B. Koster, TNO Technical Sciences, Netherlands A.F. Deutz, TNO Technical Sciences, Netherlands D.J. Naron, TNO Technical Sciences, Netherlands |
| Correspondent: | Click to Email |
TNO is designing and building an Extreme Ultra-Violet (EUV) exposure system capable of exposing samples and 6” EUV masks with high EUV power and intensity. This system will be named EBL2.
EBL2 will be suited for characterizing and analysing phenomena such as carbon growth on EUV masks, oxidation of multilayer optics, as well as investigating the physics and effects of EUV-induced plasmas.
EBL2 contains an EUV Beam Line, in which samples/EUV masks can be exposed to EUV radiation in a flexible gas environment, with UHV background vacuum quality. Gases such as H2, XCDA and H2O can be added in a controlled fashion to create a customized environment for the exposure at hand.
Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed samples/masks without breaking vacuum. Automatic mask handling with dual pods is foreseen so that exposed EUV mask will still be usable in EUV lithography tools to assess the imaging impact of the exposure.
Qualification of the setup is expected to start Q1 2016. After completion, this unique facility will be open for external customers and other research groups.
This presentation will focus on the vacuum architecture and design implementations of the EBL2 system to meet all the stringent vacuum requirements.