| AVS 62nd International Symposium & Exhibition | |
| Scanning Probe Microscopy Focus Topic | Friday Sessions |
| Session SP+AS+MI+NS+SS-FrM |
| Session: | Probe-Sample Interactions |
| Presenter: | Christopher Durcan, SUNY College of Nanoscale Science and Engineering |
| Authors: | C. Durcan, SUNY College of Nanoscale Science and Engineering V. LaBella, SUNY Polytechnic Institute |
| Correspondent: | Click to Email |
Understanding scattering of electrons in nanometer thick metal films is of fundamental and technological importance. One method to study electron scattering is with ballistic electron emission microscopy (BEEM), which is a three terminal STM based technique that measures both scattering through a metal film and the Schottky barrier height for metal-semiconductor junctions with both nanometer spatial resolution and meV energy resolution. This presentation will describe our work at understanding the relationship between the metal resistivity and the electron scattering lengths measured with BEEM by exploring metals with a range of resistivities from Ag (1.7 µΩ-cm) to Cr (12.6 µΩ-cm). In addition, nanoscale mapping of the Schottky barrier height of these metals to silicon will also be presented to understand the spatial uniformity of the transport.