AVS 62nd International Symposium & Exhibition | |
Scanning Probe Microscopy Focus Topic | Wednesday Sessions |
Session SP+2D+AS+NS+SS-WeA |
Session: | Probing Electronic and Transport Properties |
Presenter: | Corentin Durand, Oak Ridge National Laboratory |
Authors: | C. Durand, Oak Ridge National Laboratory X. Zhang, Oak Ridge National Laboratory S. Hus, Oak Ridge National Laboratory M. McGuire, Oak Ridge National Laboratory I. Vlassiouk, Oak Ridge National Laboratory A.-P. Li, Oak Ridge National Laboratory |
Correspondent: | Click to Email |
Topological insulators (TI) with characteristic topological surface states (TSS) attract great interest for both fundamental physics and device applications. However, the unavoidable presence of defects in bulk single crystals usually dopes the material leading to a metallic behavior. Thus, the direct measurement of the TSS electronic transport properties is hard to achieve due to the dominant contribution from the bulk states. Here, we measure the transport properties of Bi2Se3 crystals by Four Probe Scanning Tunneling Microscopy (4P-STM) technique at different temperatures on fresh surfaces obtained by cleavage in Ultra-High Vacuum (UHV) (base pressure = 2x10-10 Torr). In contrast to conventional models that assume two resistors in parallel to count for both the TSS and bulk conductance channels, we show that this technique can be used to differentiate the 2D contribution of TSS to the transport from the 3D contribution (bulk) by considering the potential profiles across the interface. Our method allows quantitative determination of conductivities from both channels. We also compare our results with samples exhibiting pure 2D and 3D transport behaviors. Our results shows that our approach enables direct distinguishing and accessing electronic transport of TI surfaces surface states, which can be applied to the studies of 2D to 3D crossover of conductance in other complex systems.
This research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility.