AVS 62nd International Symposium & Exhibition | |
Plasma Science and Technology | Monday Sessions |
Session PS-MoA |
Session: | Plasma Diagnostics, Sensors and Control I |
Presenter: | Anil Pandey, Chubu University, Japan |
Authors: | A. Pandey, Chubu University, Japan W. Sakakibara, DOWA Thermotech, Japan H. Matsuoka, DOWA Thermotech K. Nakamura, Chubu University, Japan H. Sugai, Chubu University, Japan |
Correspondent: | Click to Email |
Curling probe (CP), a modified form of microwave resonator probe has recently been proposed [1] which enables the local electron density measurement even in reactive plasma for non-conducting film deposition. The electron density is obtained from a shift of ¼ wavelength-resonance frequency of the spiral slot antenna in discharge ON and OFF monitored by a network analyzer (NWA). CP is a compact monitoring tool (minimum diameter 6 mm) coated with alumina or yttria for applications to semiconductor plasma processing. A variant of CP installed with an optical fiber, called opto-curling probe (OCP) has also been developed which enables simultaneous monitoring of electron density and optical emissions from plasma [2]. In this paper we demonstrate that CP can be applied not only to a constant density plasma but also to a plasma pulse-modulated at high frequency such as several tens of kHz. In case of pulse-modulated discharge, synchronization of discharge pulse with frequency sweep of NWA must be established [3]. Such CP measurement was performed in a pulsed glow discharge plasma primarily used for metal-nitridation. A CP of 16-mm diameter was inserted in a cylindrical chamber of 60 cm in diameter and 50 cm in length. A negative high-voltage pulse of -1.0 to -2.0 kV was applied to a cathode, which generates a pulsed glow plasma in different discharge gas at varying pressures. The pulse frequency was changed from 0.4 to 25 kHz with various duty cycle ratios. The NWA (Agilent E5071C) was externally triggered using on point mode and the electron density in glow phase and afterglow phase was measured in time-resolved manner in argon, nitrogen and hydrogen discharges. At higher pulse frequencies (>5 kHz), the electron density was found to be time-modulated and didn’t decay completely to zero. Also, a minimum time resolution of 2 µs was attained. Thus, CP is concluded to be a powerful tool for the time-resolved electron density monitoring in pulse-modulated plasma often used in industrial materials processing.
[1] I. Liang, K. Nakamura, and H. Sugai, Appl. Phys. Express 4, 066101 (2011).
[2] A. Pandey, K. Nakamura, and H. Sugai, Appl. Phys. Express 6, 056202 (2013).
[3] A. Pandey, W. Sakakibara, H. Matsuoka, K. Nakamura, and H. Sugai, Appl. Phys. Lett. 104 (2014) 024111.