AVS 62nd International Symposium & Exhibition | |
Plasma Science and Technology | Monday Sessions |
Session PS+SE-MoM |
Session: | Atmospheric Pressure Plasma Processing I |
Presenter: | Souvik Ghosh, Case Western Reserve University |
Authors: | S. Ghosh, Case Western Reserve University R. Yang, Case Western Reserve University P.X.-L. Feng, Case Western Reserve University C.A. Zorman, Case Western Reserve University R.M. Sankaran, Case Western Reserve University |
Correspondent: | Click to Email |
Patterned metal formation on substrates is typically achieved by subtractive methods. Recently, additive manufacturing techniques have emerged that can selectively deposit materials to produce patterned structures. Examples of additive methods include ink-jet, aerosol, and screen printing. A common feature of all of these approaches is the ink, a solution of stabilized colloidal metal nanoparticles that is deposited onto an arbitrary substrate. Removal of the organic stabilizers is often carried out by annealing at high temperatures (>200 oC) to produce electrically conductive features, limiting what substrates can be used. There are also challenges with deposition of the inks associated with the viscosity and adhesion of the inks to the substrate.
An alternative approach to fabricating patterned metals in polymers is in situ reduction of metal containing polymers. Here, we present an atmospheric-pressure microplasma process for the selective reduction of metal ions in polymer films to produce flexible, electrically-conductive metal patterns [1]. The films are made from polyacrylic acid (PAA) which reversibly cross links with metal cations such as silver (Ag+). The films are subsequently exposed to a microplasma formed in a flowing argon gas on a two-dimensional scanning stage to “write” a desired pattern. Characterization of the films by X-ray diffraction (XRD) confirms that the Ag+ is reduced to crystalline Ag after exposure to the microplasma. Further materials analysis by scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDX) show that reduction leads to the formation of Ag nanoparticles whose size and morphology depend on the exposure conditions (i.e. plasma current, scanning rate, etc.). Cross-sectional characterization of the films shows that the reduction does not penetrate through the film bulk. We suggest that the Ag+ diffuses to the film surface during reduction, leading to a near-surface layer of reduced crystalline Ag with bulk resistivity ~1 mΩ-cm. Stretchable films have been produced by casting PAA-Ag+ films on top of a polydimethylsiloxane (PDMS) substrate, followed by exposure to the microplasma. Dynamic mechanical analysis (DMA) of the multilayer films yield a breaking force value of >3 MPa and the films can be stretched to >100%. Electrical measurements are performed on the films as a function of strain to analyze the change in resistivity with stretching. We will also present our recent efforts to reduce the size of the patterns, which is currently ~100 µm, to approximately 10 µm by incorporating stencil masks.
[1] S. Ghosh et al., ACS Appl. Mater. Interfaces 6, 3099 (2014).