AVS 62nd International Symposium & Exhibition
    Electronic Materials and Processing Thursday Sessions
       Session EM+MS-ThM

Invited Paper EM+MS-ThM5
Nanofabrication of Advanced Nanophotonic Structures by Nanoimprinting

Thursday, October 22, 2015, 9:20 am, Room 210E

Session: III-N Nitrides for Optoelectronic Applications
Presenter: Stefano Cabrini, Lawrence Berkeley National Laboratory (LBNL)
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To exploit the potentialities of Nanophotonics, it is important to control the properties of the material at the nanometer scale, obtaining a good agreement between the experiments and the theory. Nanofabrication can open the way for new concept of devices. In this presentation we will present the fabrication and characterization of simple photonic crystals directly pattern by nanoimprinting using a special functional resist with high refractive index.