AVS 62nd International Symposium & Exhibition
    Applied Surface Science Thursday Sessions
       Session AS-ThP

Paper AS-ThP13
Covalent Surface Modification of Silicon Oxide Substrate using Aliphatic Alcohols and Microwave Radiation

Thursday, October 22, 2015, 6:00 pm, Room Hall 3

Session: Applied Surface Science Poster Session
Presenter: Austin Lee, Simon Fraser University, Canada
Authors: A. Lee, Simon Fraser University, Canada
B.D. Gates, Simon Fraser University, Canada
Correspondent: Click to Email
Microwave radiation is used to react alcohols with silicon oxide surfaces to form self-assembled monolayers (SAMs). Advantages of using alcohols as building blocks for the formation of SAMs include their widespread availability, ease of handling, and stability against side reactions. Challenges to preparing monolayers of aliphatic alcohols on silicon oxide surfaces include the relatively high temperatures and slow reaction kinetics of the alcohol condensation reaction. Microwave radiation delivers sufficient thermal energy for the condensation reaction to occur in a fast, efficient manner. To demonstrate this capability, monolayers of 1-butanol, 1-octanol, and 1-octadecanol were successfully formed with the assistance of a microwave oven, and the monolayers were evaluated using Soxhlet extraction, WCA, AFM, and XPS. We optimized this reaction to render the silicon oxide surfaces hydrophobic, and successfully coated alcohols onto both the native oxide of silicon substrates and glass microscope slides.