| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-WeM1 Self-Consistent Modeling of Capacitive Coupling in Inductively Coupled Plasmas Ankur Agarwal, S. Rauf, K. Collins, Applied Materials Inc. |
| 8:20am | PS2-WeM2 Experimentally Guided Development of a Dielectric Etch Plasma Model Ajit Balakrishna, S. Rauf, K. Collins, Applied Materials Inc. |
| 8:40am | PS2-WeM3 Insights to Critical Dimension Control Through 3-Dimensional Profile Simulation For Plasma Etching Yiting Zhang, M.J. Kushner, University of Michigan, S. Sriraman, A. Paterson, Lam Research Corp |
| 9:00am | PS2-WeM4 3-Dimensional Model for Electron-Beam Generated Plasma Shahid Rauf, A. Balakrishna, A. Agarwal, J. Kenney, L. Dorf, K. Collins, Applied Materials Inc. |
| 9:20am | PS2-WeM5 From Nonlocal Electron Kinetic Theory to Practical Applications Igor Kaganovich, Princeton Plasma Physics Laboratory, D. Sydorenko, University of Alberta, Canada, A. Khrabrov, Y. Raitses, Princeton Plasma Physics Laboratory, P. Ventzek, L. Chen, Tokyo Electron America, Inc. |
| 9:40am | PS2-WeM6 Electromagnetic Modeling of Inductively-Coupled Plasma Sources with Realistic Plasma Loads Jason Kenney, S. Rauf, K. Collins, Applied Materials, Inc. |
| 11:00am | PS2-WeM10 Two Dimensional Simulations of the Impact of Weak Magnetic Fields on the Plasma Properties of a Planar Slot Antenna Surface Wave Driven Plasma Source Jun Yoshikawa, Tokyo Electron Ltd., Y. Susa, Tokyo Electron Miyagi Limited, P. Ventzek, Tokyo Electron America, Inc. |
| 11:20am | PS2-WeM11 Analytical Model of Plasma Sheaths at Intermediate Radio Frequencies Mark Sobolewski, NIST |
| 11:40am | PS2-WeM12 Invited Paper Plasma Prize Invited Lecture: Simulations of Plasma Processes and Equipment for Semiconductor Device Fabrication Peter Ventzek, Tokyo Electron America, Inc. |