AVS 61st International Symposium & Exhibition
    Plasma Science and Technology Friday Sessions
       Session PS2-FrM

Paper PS2-FrM3
Utilizing Absorption, Emission, and Fluorescence Spectroscopies to Elucidate the Energetics of Plasma-Surface Interactions

Friday, November 14, 2014, 9:00 am, Room 308

Session: Plasma Surface Interactions II
Presenter: Ellen Fisher, Colorado State University
Authors: J.M. Blechle, Colorado State University
R.B. Davidson, Colorado State University
E.J. Sutor, Colorado State University
E.R. Fisher, Colorado State University
Correspondent: Click to Email
Plasma-enhanced chemical vapor deposition (PECVD), plasma etching, and plasma modification of surfaces are integral to a range of technologies including microelectronics, optical or protective coatings and biomaterials. Many mechanistic details for plasma processing of these materials, however, remain unknown. Understanding surface interactions of plasma species provides critical molecular level information about plasma processing, especially at interfaces. In addition, power dissipation and energetics are also important for elucidation of mechanistic details in plasma-surface interactions. The imaging of radicals interacting with surfaces (IRIS) technique measures interactions of radicals during plasma processing of a variety of materials. This technique combines molecular beam and plasma technologies with laser-induced fluorescence (LIF) to provide information on radical-surface interactions during plasma processing. Furthermore, IRIS provides direct information on the energetics of plasma-generated radicals as well as for species scattering off of surfaces. IRIS data for species in PECVD and etching environments will be presented. We have also employed both time-resolved optical emission spectroscopy (TR-OES) and broadband absorption spectroscopy (BAS) to our plasma systems to further explore the gas-phase chemistry and gas-surface interactions. In particular, IRIS, TR-OES and BAS data on oxygen-containing systems (O atoms, OH radicals), fluorocarbon radicals (CF and CF2), , and nitrogen-containing molecules (NO, NH, NH2, CN) will be presented by comparing and contrasting these groups of molecules. Correlation of gas-phase data, surface analysis information, and plasma-surface interface reactions will also be presented to provide more comprehensive mechanisms for overall plasma polymerization processes.