AVS 61st International Symposium & Exhibition
    Spectroscopic Ellipsometry Focus Topic Thursday Sessions
       Session EL+AS+EM+EN+SS-ThM

Paper EL+AS+EM+EN+SS-ThM12
Cu surface reactions in hydrochloric solution probed on the atomic scale by polarization optical methods and STM

Thursday, November 13, 2014, 11:40 am, Room 304

Session: Spectroscopic Ellipsometry for Photovoltaics and Instrument Development
Presenter: Christoph Cobet, Johannes Kepler University, Austria
Authors: C. Cobet, Johannes Kepler University, Austria
Gh. Barati, Johannes Kepler University, Austria
V. Solokha, Johannes Kepler University, Austria
K. Hingerl, Johannes Kepler University, Austria
Correspondent: Click to Email

Electrochemical reactions on metal electrodes have been in the focus of many scientific studies and Cu is probably the most investigated example. Mainly, the interest on Cu is motivated by by questions concerning e.g. the corrosion behavior or the optimization of electro-polishing procedures. Classical electrochemical approaches contain usually a description of the occurring reaction products and concentrations. However, it is evident that a fundamental understanding also requires knowledge about the microscopic occurrence of the metal-electrolyte interface. Desirable is a fundamental knowledge as it is obtained already for surfaces in UHV. But unfortunately, most of the classical surface sensitive techniques cannot be applied in liquid environments. Thus it is not surprising that many fundamental issues in electrochemical reactions are still unsolved.

In our work we combine reflection anisotropy spectroscopy, spectroscopic ellipsometry, and a homemade electrochemical scanning tunneling microscope to study Cu single crystals in hydrochloric solutions. With these methods we enabled monitoring of the local appearance as well as the dynamics of interface transformations/reactions on the atomic scale. In particular it was possible to explain for the (110) surface in more detail the correlation of Faraday-current and structural transformation. Here, the Cl adsorption minimizes the surface energy by a formation of monoatomic steps parallel to the [001] direction which finally ends in a faceting of the surface. It turns out that characteristic redox peaks in cyclic voltammograms correlate with the stabilization of certain arrangements of these steps. The structures are formed first by Cu dissolution and at higher anodic potentials by rearrangement of Cu atoms in the surface. It is remarkable that the latter process compares nicely with oxide/chloride induced surface transformations which are observed in UHV. The comparison with the UHV results in turn is used to achieve a more comprehensive model for the processes in electrochemical environment.