| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-ThA1 Invited Paper Damage Control: Electron Beam Generated Plasmas for Low Te Processing S.G. Walton, Naval Research Laboratory |
| 2:40pm | PS-ThA3 Numerical Simulation of Oxidation Process in Silicon by O2 Gas Cluster Beam K. Mizotani, M. Isobe, S. Hamaguchi, Osaka University, Japan |
| 3:00pm | PS-ThA4 Ultra-low k Dielectric and Plasma Damage Control for Advanced Technology Nodes (10-nm and Below) F. Lazzarino, IMEC, Belgium, M. Krishtab, KU Leuven, Belgium, S. Tahara, TEL, Belgium, M. Baklanov, IMEC, Belgium |
| 3:40pm | PS-ThA6 High Temperature Etching of GaN Preserving Smooth and Stoichiometric GaN Surface R. Kometani, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, Nagoya University, Japan |
| 4:00pm | PS-ThA7 Investigation of Surface Roughness in III-V Semiconductors After an In Situ Hydrogen Plasma Clean Prior to PEALD E. Cleveland, NRL-ASEE, L. Ruppalt, B. Bennett, S.M. Prokes, NRL |
| 4:20pm | PS-ThA8 Fabrication of GaAs/AlGaAs Nano-Pillars using Bio-Template Combined with Neutral Beam Defect-Free Etching C. Thomas, Y. Tamura, A. Higo, Tohoku University, Japan, N. Okamoto, I. Yamashita, Nara Institute of Science and Technology, Japan, S. Samukawa, Tohoku University, Japan |
| 4:40pm | PS-ThA9 Conductive Carbon Film Formation at Low Temperature (R. T.) using Neutral-Beam-Enhanced Chemical-Vapor-Deposition Y. Kikuchi, Tohoku University and Tokyo Electron, Japan, S. Samukawa, Tohoku University, Japan |
| 5:00pm | PS-ThA10 Numerical Simulation of Total Processes of Neutral Beam Etching from Generation of Neutral Beam by Collision of Ions against Graphite Sidewall to 3-dimensional Etching Profile N. Watanabe, S. Ohtsuka, Mizuho Information & Research Inst., Japan, S. Mochizuki, Mathematical Systems, Japan, T. Kubota, Tohoku Univ., Japan, T. Iwasaki, Y. Iriye, K. Ono, Mizuho Information & Research Inst., Japan, S. Samukawa, Tohoku Univ., Japan |
| 5:20pm | PS-ThA11 Controlling the Attributes of Electron Beam Generated Processing Plasmas D.R. Boris, E.H. Lock, R.F. Fernsler, S.G. Walton, Naval Research Laboratory |
| 5:40pm | PS-ThA12 Time-resolved Discharge Observation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process T. Cho, Y. Sen, R. Bokka, S. Park, D. Lubomirsky, S. Venkataraman, Applied Materials Inc. |