| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Effects of Plasma-Induced Si Damage Structures on Annealing Process Design—Gas Chemistry Impact A. Matsuda, Y. Nakakubo, Kyoto University, Japan, M. Fukasawa, Sony Corporation, Japan, Y. Takao, K. Eriguchi, Kyoto University, Japan, T. Tatsumi, Sony Corporation, Japan, K. Ono, Kyoto University, Japan |
| 8:40am | PS-MoM2 Advancing Patterning Processes Further by Employing a New Gas S.U. Engelmann, E.A. Joseph, R.L. Bruce, H. Miyazoe, W.S. Graham, E.M. Sikorski, IBM T.J. Watson Research Center, M. Nakamura, T. Suzuki, Zeon Chemicals LP, H. Matsumoto, A. Itou, T. Suzuki, Zeon Corporation |
| 9:00am | PS-MoM3 Advanced Etching Gas Development for High Aspect Ratio Structures R. Gupta, C. Anderson, V. Surla, B. Lefevre, V. Pallem, N. Stafford, Air Liquide |
| 9:20am | PS-MoM4 Highly Selective Etch of PMMA to PS for DSA Lithography by Using Carbon Containing Gas 100 MHz CCP RIE System T. Imamura, H. Yamamoto, M. Omura, I. Sakai, H. Hayashi, Toshiba Corporation Semiconductor Company, Japan |
| 9:40am | PS-MoM5 New Fluorocarbon Free Chemistry Proposed As Solution to Limit Porous SiOCH Film Modification during Etching N. Posseme, CEA-LETI, France, L. Vallier, CNRS-LTM, France, C.-L. Kao, AMAT, C. Licitra, CEA-LETI, France, C. Mannequin, CNRS-LTM, France, J. Pender, S. Nemani, AMAT |
| 10:00am | PS-MoM6 Characterization of the Effects of Mildly Oxidizing Chemistries on Silicon Oxidation for Advanced Photoresist-Strip Applications B. Thedjoisworo, B. Jacobs, I. Berry, D. Cheung, J. Park, Lam Research |
| 10:40am | PS-MoM8 Invited Paper Challenges in Etching of Multicomponent Oxides and Other Difficult-To-Etch Materials J. Margot, Université de Montréal, Canada, M. Chaker, INRS, Canada |
| 11:20am | PS-MoM10 Thermodynamic Approach to Select Viable Etch Chemistry for Magnetic Metals T. Kim, K. Chen, J.P. Chang, University of California at Los Angeles |
| 11:40am | PS-MoM11 Studies on Highly Selective Si3N4 Spacer Etching over Si/SiO2 using CH3F/O2 Plasmas B. Parkinson, A. Raley, A. Ranjan, K. Kumar, P. Biolsi, TEL Technology Center, America, LLC |