| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
| Session PS-TuP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | J.S. Restrepo, University of Mexico |
| Authors: | J.S. Restrepo, University of Mexico S. Muhl, Universidad Nacional Autonoma de Mexico J. Cruz, Universidad Nacional Autonoma de Mexico |
| Correspondent: | Click to Email |
The substrate heating by the plasma on the magnetron sputtering process is a knowledge process that has not been extended studied such as involve complex effects like ion, excited and neutral surface bombardment and radiation heat from the plasma. To this end we have constructed a multi- point thermocouple to study the spatial variation of the substrate heating under a range of experimental conditions, plasma power and Ar gas pressure during DC magnetron sputtering of titanium. Additionally, we have studied the effect of allowing the thermocouples to be floating, connected to ground and reactive environment. The results showed that the substrate temperature can reach temperature more than 200ºC with a plasma power of 200W and that the highest temperature is localized in front at the race track due to a higher degree of particle bombardment.