AVS 60th International Symposium and Exhibition
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP22
A Comparative Study of New Algorithm for Fluid Simulation of High Density Plasma Discharges

Tuesday, October 29, 2013, 6:00 pm, Room Hall B

Session: Plasma Science and Technology Poster Session
Presenter: H. Choe, Korea Aerospace University, Republic of Korea
Authors: S.G. Oh, Korea Aerospace University, Republic of Korea
Y.J. Lee, Korea Aerospace University, Republic of Korea
J.H. Jeon, Korea Aerospace University, Republic of Korea
J.H. Seo, Korea Aerospace University, Republic of Korea
H. Choe, Korea Aerospace University, Republic of Korea
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The inductively coupled plasma or the capacitively coupled plasma reactors are typical ones in the material processes for the electronic device fabrications such as semiconductor, TFT-LCD, solar cell. Fluid simulation is one of the simulation method in transport modeling of these discharges, because the profiles of plasma quantities such as densities, temperatures, fluxes and potentials are easily obtained. It is known that there is a restriction on the simulation time step, because the shielding time scale of an electric field perturbation is very short. To overcome this limitation, semi-implicit methods are suggested for the solution of Poisson’s equations. In this work, from the physical origin of restriction on simulation time step, a new method for larger time step in the steady-state fluid simulation of high density plasma discharge is suggested, and is explained. To study the differences and similarities, a simple comparison of the new method with previously known one is given.