| 8:00am |
TF1+EM-WeM1 Invited Paper
Vapor-Phase Fabrication of Organic-Inorganic Hybrid Thin Films Using Molecular Layer Deposition with Atomic Layer Deposition
Myung Mo Sung, Hanyang University, Korea |
| 8:40am |
TF1+EM-WeM3
Metalcone and Metalcone/Metal Oxide Alloys Grown Using Atomic & Molecular Layer Deposition Techniques
Byoung H. Lee, V.R. Anderson, S.M. George, University of Colorado, Boulder |
| 9:00am |
TF1+EM-WeM4
Sequential Vapor Infiltration and Atomic Layer Deposition on Surfactant Films for Mesoporous Metal Oxide
Bo Gong, D. Kim, G.N. Parsons, North Carolina State University |
| 9:20am |
TF1+EM-WeM5
Flexibility and Water Vapor Transmission Rates for Al-, Hf-, and Zr-based ALD Films and Nanolaminates Utilizing Water and Glycerol Co-Reactants
Mark Sowa, E.W. Deguns, Cambridge NanoTech, Inc. |
| 9:40am |
TF1+EM-WeM6
Polymer Wires Containing Quantum Dots with Different Lengths Grown by Molecular Layer Deposition: Potential Applications to Sensitization in Photovoltaics
Tetsuzo Yoshimura, R. Ebihara, A. Oshima, Tokyo University of Technology, Japan |
| 10:40am |
TF1+EM-WeM9 Invited Paper
Hybrid Materials by Vapor Phase Infiltration
Mato Knez, Max-Planck-Institut für Mikrostrukturphysik, Germany |
| 11:20am |
TF1+EM-WeM11
Titanicone Molecular Layer Deposition Using TiCl4 and Sugar Alcohols and Porous TiO2 Films Produced by Annealing
Robert A. Hall, A.I. Abdulagatov, S.M. George, University of Colorado, Boulder |