AVS 58th Annual International Symposium and Exhibition | |
Thin Film Division | Wednesday Sessions |
Session TF1+EM-WeM |
Session: | ALD/MLD: Hybrid Organic Films |
Presenter: | Mark Sowa, Cambridge NanoTech, Inc. |
Authors: | M.J. Sowa, Cambridge NanoTech, Inc. E.W. Deguns, Cambridge NanoTech, Inc. |
Correspondent: | Click to Email |
Here we will report on the flexibility of aluminum-, hafnium-, and zirconium-based ALD films deposited on representative substrate material samples of polyethylene napthalate(PEN) at 115°C. Metal precursors used were trimethyl aluminum(TMA), tetrakis(dimethylamino)hafnium(TDMAH), and tetrakis(dimethylamino)zirconium(TDMAZ). Water was used as the ALD co-reactant for producing inorganic films while glycerol was utilized as the co-reactant for depositing hybrid organic films. Various nanolaminate combinations of the inorganic/organic materials were also investigated for their response to various levels of strain. Inorganic Al2O3 films subjected to 2% strain were observed to begin cracking at thicknesses below 27nm. A 2% strain did not cause any cracking on organic films deposited with TMA and glycerol to the thickest film studied at 245nm. Organic films were always observed to be more flexible than inorganic films of the same thickness. Nanolaminates were observed to have flexibility intermediate to their pure inorganic and organic constituents.
WVTR measurements were performed on inorganic, organic, and nanolaminate aluminum films. A WVTR of 6.1e-6 g/m2/day was obtained for a 100nm inorganic Al2O3 film. A substantially more flexible 100nm TMA + glycerol film gave a WVTR of 9.2e-6 g/m2/day.
The technical issues associated with uniformly delivering glycerol to a 115°C ALD reactor will also be discussed.