| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-WeA1 Integrated Power Delivery Systems for Next Generation Plasma Processes Fernando Tomasel, M. Watanabe, D. Carter, Advanced Energy Industries |
| 2:20pm | PS-WeA2 Remote VHF Source for High Efficiency Plasma Generation Dan Carter, D.J. Hoffman, R. Grilley, K. Peterson, Advanced Energy Industries |
| 2:40pm | PS-WeA3 Invited Paper Study of Radio Frequency Breakdown Mechanisms in a Plasma Environment John Caughman, R.H. Goulding, D.A. Rasmussen, Oak Ridge National Laboratory, C.H. Castano Giraldo, M. Aghazarian, University of Illinois at Urbana Champaign, E.H. Martin, S.C. Shannon, North Carolina State University |
| 4:00pm | PS-WeA7 A Narrow Ion Energy Distribution Bias System Victor Brouk, Advanced Energy Industries, S.C. Shannon, North Carolina State University, D.J. Hoffman, D. Carter, W. Hattel, Advanced Energy Industries |
| 4:20pm | PS-WeA8 Effect of Multi-frequency Bias on Ion Energy Distribution in Inductively Coupled Plasma Ankur Agarwal, A. Balakrishna, S. Rauf, K. Collins, Applied Materials, Inc. |
| 4:40pm | PS-WeA9 Electron Energy Distribution at Electrode in a Low Pressure Capacitively Coupled Plasma Shahid Rauf, L. Dorf, A. Agarwal, K. Collins, Applied Materials, Inc. |
| 5:00pm | PS-WeA10 Invited Paper The Control of Electron Shading and Plasma EEDf in a DC/RF Parallel-Plate Etcher Lee Chen, Tokyo Electron America |
| 5:40pm | PS-WeA12 Negative Plasma Potentials Produced by Electropositive Plasmas in a Multi-Dipole Chamber Noah Hershkowitz, University of Wisconsin-Madison, L. Oksuz, Suleyman Demirel University, Turkey, J.P. Sheehan, University of Wisconsin-Madison |