|AVS 58th Annual International Symposium and Exhibition|
|Plasma Science and Technology Division||Wednesday Sessions|
Click a paper to see the details. Presenters are shown in bold type.
Integrated Power Delivery Systems for Next Generation Plasma Processes
F.G. Tomasel, M. Watanabe, D. Carter, Advanced Energy Industries
Remote VHF Source for High Efficiency Plasma Generation
D. Carter, D.J. Hoffman, R. Grilley, K. Peterson, Advanced Energy Industries
|2:40pm||PS-WeA3 Invited Paper
Study of Radio Frequency Breakdown Mechanisms in a Plasma Environment
J.B.O. Caughman, R.H. Goulding, D.A. Rasmussen, Oak Ridge National Laboratory, C.H. Castano Giraldo, M. Aghazarian, University of Illinois at Urbana Champaign, E.H. Martin, S.C. Shannon, North Carolina State University
A Narrow Ion Energy Distribution Bias System
V. Brouk, Advanced Energy Industries, S.C. Shannon, North Carolina State University, D.J. Hoffman, D. Carter, W. Hattel, Advanced Energy Industries
Effect of Multi-frequency Bias on Ion Energy Distribution in Inductively Coupled Plasma
A. Agarwal, A. Balakrishna, S. Rauf, K. Collins, Applied Materials, Inc.
Electron Energy Distribution at Electrode in a Low Pressure Capacitively Coupled Plasma
S. Rauf, L. Dorf, A. Agarwal, K. Collins, Applied Materials, Inc.
|5:00pm||PS-WeA10 Invited Paper
The Control of Electron Shading and Plasma EEDf in a DC/RF Parallel-Plate Etcher
L. Chen, Tokyo Electron America
Negative Plasma Potentials Produced by Electropositive Plasmas in a Multi-Dipole Chamber
N. Hershkowitz, University of Wisconsin-Madison, L. Oksuz, Suleyman Demirel University, Turkey, J.P. Sheehan, University of Wisconsin-Madison