| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Wednesday Sessions |
| Session PS-WeA |
| Session: | Plasma Sources |
| Presenter: | Victor Brouk, Advanced Energy Industries |
| Authors: | V. Brouk, Advanced Energy Industries S.C. Shannon, North Carolina State University D.J. Hoffman, Advanced Energy Industries D. Carter, Advanced Energy Industries W. Hattel, Advanced Energy Industries |
| Correspondent: | Click to Email |
Conventional bias systems use sine wave voltage systems to achieve ion energy distribution functions for the creation of thin films. By combining dual frequency sine waves, the mean energy and its spread can be independently controlled1. Arbitrary wave-shaping has been suggested to create single energy near-delta function distributions2. We investigate a system where the waveform is defined a priori where two elements are run in a feed forward system to control the instantaneous IEDF. We evaluate the effectiveness of this system in an argon/oxygen plasma at typical operating pressures inside the 10-150 mT range at plasma densities in the low 1010 cm-3 range.
1 S. Shannon et al.; J. Appl. Phys. 97, 103304 (2005)
2 Wendt A. et. al., “Method and apparatus for plasma processing with control of ion energy distribution at the substrates”, US Patent 6201208, March 13, 2001