| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS+SS-ThA1 Invited Paper Plasma Prize Lecture - The Role of Atomic Hydrogen on Plasma Synthesis of Carbon Nanotubes Eray Aydil, University of Minnesota |
| 2:40pm | PS+SS-ThA3 CF and CF2 Contributions to Plasma-Enhanced Chemical Vapor Deposition of Fluorocarbon Films in CxFy Systems Michael Cuddy, E.R. Fisher, Colorado State University |
| 3:00pm | PS+SS-ThA4 Polymer Surface Modification: Real-time In Situ Electron Spin Resonance Study for Plasma Processes Kenji Ishikawa, N. Sumi, Nagoya University, Japan, A. Kono, H. Horibe, Kanazawa Institute of Technology, Japan, K. Takeda, H. Kondo, M. Sekine, M. Hori, Nagoya University, Japan |
| 3:40pm | PS+SS-ThA6 Control of Hydrocarbon Surface Density during H2/D2/Ar Low Temperature Plasma Interaction Nick Fox-Lyon, G.S. Oehrlein, University of Maryland, College Park, N. Ning, D.B. Graves, University of California, Berkeley |
| 4:00pm | PS+SS-ThA7 Atomic Force Microscopy Determination of the Elastic Modulus of Nanometer Thick, Ultra-Stiff Modified Layers after Plasma Etching of a Polymer Film Tsung-Cheng Lin, University of Maryland, College Park, H.C. Kan, National Chung Cheng University, Taiwan, Republic of China, R.L. Bruce, G.S. Oehrlein, R.J. Phaneuf, University of Maryland, College Park |
| 4:20pm | PS+SS-ThA8 Polymer Hardening Technique for Enhancement in Etch Selectivity/Durability Using DC Superimposed Capacitively-Coupled Plasma Shin Okamoto, A. Nakagawa, F. Inoue, H. Oka, Tokyo Electron Miyagi Ltd., Japan, H. Mochiki, K. Yatsuda, Tokyo Electron Ltd., Japan |
| 4:40pm | PS+SS-ThA9 H2O Plasma Surface Modification of Track-Etched Polycarbonate Membranes Leading to Polar Surface Functionalization and Improved Wettability Brendan Tompkins, J.M. Dennison, E.R. Fisher, Colorado State University |
| 5:00pm | PS+SS-ThA10 Plasma Printing: A New Inline Technology for Polymers Surface Modification E.A.D. Carbone, M.W.G.M. Verhoeven, Eindhoven University of Technology, Netherlands, Wouter Brok, A. Stevens, Innophysics B.V., Netherlands, J.J.A.M. van der Mullen, Eindhoven University of Technology, Netherlands |
| 5:20pm | PS+SS-ThA11 Design of a Plasma Cleaning Unit to Clean Backside Contamination on Substrates Freek Molkenboer, N.B. Koster, A.J. De Jong, J.C.J. van der Donck, A.M.C.P. de Jong, O. Kievit, TNO, Netherlands |