| AVS 58th Annual International Symposium and Exhibition | |
| Helium Ion Microscopy Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | HI+AS-TuA1 Invited Paper Principles of Helium Ion Microscopy John Notte, L. Scipioni, L.A. Stern, Carl Zeiss NTS |
| 2:40pm | HI+AS-TuA3 Design and Performance of a Near Ultra High Vacuum Helium Ion Microscope Raoul van Gastel, University of Twente, The Netherlands, L. Barriss, J.A. Notte, Carl Zeiss NTS, G. Hlawacek, University of Twente, The Netherlands, L. Scipioni, A.P. Merkle, D. Voci, Carl Zeiss NTS, C. Fenner, LVestus Energy Inc., H. Zandvliet, B. Poelsema, University of Twente, The Netherlands |
| 3:00pm | HI+AS-TuA4 Sub-10 nm Scanning Helium Ion Beam Lithography K. van Langen, E.W.J.M. van der Drift, Delft University of Technology, Netherlands, E. van Veldhoven, D.J. Maas, TNO, Netherlands, Paul Alkemade, Delft University of Technology, Netherlands |
| 4:00pm | HI+AS-TuA7 Invited Paper Contrast Performance in Helium Ion Microscopy David Bell, Harvard University |
| 5:00pm | HI+AS-TuA10 Helium Ion Beam Induced Deposition Examined using a 3D Monte Carlo Simulation Daryl Smith, P.D. Rack, University of Tennessee Knoxville, P.F.A. Alkemade, H. Miro, Delft University of Technology, The Netherlands |
| 5:20pm | HI+AS-TuA11 TEM Specimen Preparation with Light Ions Lucille Giannuzzi, L.A. Giannuzzi & Associates LLC |
| 5:40pm | HI+AS-TuA12 The Possibilities of the HIM for Imaging and Nanopatterning of EUVL Masks D.J. Maas, E. van Veldhoven, Norbert Koster, TNO, Netherlands, P.F.A. Alkemade, E.W.J.M. van der Drift, Delft University of Technology, Netherlands |