AVS 58th Annual International Symposium and Exhibition
    Energy Frontiers Focus Topic Monday Sessions

Session EN+PS-MoM
Plasmas for Photovoltaics & Energy Applications

Monday, October 31, 2011, 8:20 am, Room 103
Moderator: Sumit Agarwal, Colorado School of Mines


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am EN+PS-MoM1 Invited Paper
Plasma Energy R&D at National Fusion Research Institute (NFRI): Fusion Energy, Silicon Quantum Dot Solar Cell, and Plasma-Enhanced Coal Gasification
Suk Jae Yoo, National Fusion Research Institute, Republic of Korea
9:00am EN+PS-MoM3
Synthetic Fuel Processing through Plasma-Assisted CO2 Conversion
Stefan Welzel, S. Ponduri, F. Brehmer, M. Creatore, M.C.M. van de Sanden, R. Engeln, Eindhoven University of Technology, Netherlands
9:20am EN+PS-MoM4
Effective Light Trapping for Crystalline Silicon Solar Cells by Plasma Texturing
F.M.M. Souren, Eindhoven University of Technology, Netherlands, Jochen Rentsch, Fraunhofer Institute for Solar Energy Systems (ISE), Germany, M.C.M. van de Sanden, Eindhoven University of Technology, Netherlands
9:40am EN+PS-MoM5
RF-PECVD Processes Excited by Asymmetric Voltage Waveforms
Pierre-Alexandre Delattre, S. Pouliquen, Laboratoire de Physique des Plasmas, France, E.V. Johnson, Laboratory of Physics of Interfaces and Thin Films, France, J.-P. Booth, Laboratoire de Physique des Plasmas, France
10:00am EN+PS-MoM6
Spontaneous and High Rate Synthesis of Nanocrystalline Silicon by Expanding Thermal Plasma
İlker Doğan, NJ. Kramer, M.A. Verheijen, Eindhoven University of Technology, Netherlands, K. Dohnalova, T. Gregorkiewicz, University of Amsterdam, Netherlands, M.C.M. van de Sanden, Eindhoven University of Technology, Netherlands
10:40am EN+PS-MoM8
SiH4 and SiF4 Dissociation in Matrix Distributed ECR Sources, and Potential for High Deposition Rate of Thin Film Silicon Alloys
Samir Kasouit, Total S.A, France, P. Bulkin, P. Roca i Cabarrocas, LPICM, France
11:00am EN+PS-MoM9
The Effects of Showerhead Hole Structure on the Deposition of uc-Si:H Thin Films by VHF PECVD
Sung-Suk Wi, Y.-G. Kim, H.-J. Lee, Pusan National University, Republic of Korea, D. Kim, D. Hwang, W.S. Chang, LG Electronics, Republic of Korea
11:20am EN+PS-MoM10 Invited Paper
Plasma-Enhanced CVD and ALD Prepared Nanolayers for High-Efficiency Solar Cell Manufacturing
Erwin Kessels, Eindhoven University of Technology, the Netherlands