|AVS 58th Annual International Symposium and Exhibition|
|Exhibitor Technology Spotlight||Tuesday Sessions|
|Session:||Exhibitor Technology Spotlight|
|Presenter:||D. Surman, Kratos Analytical Inc.|
|Authors:||D. Surman, Kratos Analytical Inc.
C. Blomfield, Kratos Analytical Ltd., UK
A. Roberts, Kratos Analytical Ltd., UK
S. Page, Kratos Analytical Ltd., UK
|Correspondent:||Click to Email|
Over the last several years multiple methods have developed for the depth profile analysis of organic materials using a variety of different polyatomic species as the sputtering ion. It has also become clear that different classes of polymers require quite different sputtering parameters to be effectively profiled with no loss of chemical information. In this presentation we discuss a variety of approaches that have developed in order to effectively sputter profile a wide range of materials. These approaches utilize differences in ion beam energy, impact angle and sample temperature in order to achieve an effective sputter profile.