| AVS 58th Annual International Symposium and Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Thursday Sessions |
| Session EL-ThP |
| Session: | Spectroscopic Ellipsometry Poster Session |
| Presenter: | Neil Murphy, Air Force Research Laboratory |
| Authors: | N. Murphy, Air Force Research Laboratory L. Sun, Air Force Research Laboratory and General Dynamics Information Technology A. Waite, Air Force Research Laboratory and Universal Technology Corporation J. Jones, Air Force Research Laboratory R. Jakubiak, Air Force Research Laboratory |
| Correspondent: | Click to Email |
Germanium films were deposited on both glass and silicon substrates using high power impulse magnetron sputtering (HiPIMS). Throughout the deposition process, the optical constants and thicknesses were measured and recorded via in-situ spectroscopic ellipsometry. Preliminary analysis of the films’ optical behavior has indicated that the refractive index is highly sensitive to changes in thickness. As film thickness increases from 100 to 500 Å, the refractive index displays the tendency to slowly decrease due to void porosity, lack of crystalline order and surface roughness. The preservation of the refractive index seen in the HiPIMS deposited Ge films is a direct result of their high density and low void fraction, following the relationship between density and refractive index as given by the Gladstone-Dale approximation.