| AVS 58th Annual International Symposium and Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Friday Sessions |
| Session EL+AS+EM+MS+PS+TF-FrM |
| Session: | Spectroscopic Ellipsometry: Future Directions and New Techniques |
| Presenter: | Gai Chin, ULVAC Inc., Japan |
| Correspondent: | Click to Email |
Recently, we developed a compact, high-speed spectroscopic ellipsometer. It analyzes the spectrums obtained from the polarization interference occurring between two multiple-order retarders which snapshot the wavelength distribution of the sample’s spectroscopic polarization parameters. This innovative spectroscopic ellipsometer can measure the thickness and optical constants of thin films at a dramatically fast speed. Its acquisition time is as short as 10 ms. It does not require the conventional complex mechanical or active components for polarization-control, such as a rotating compensator and an electro-optical modulator. It can open great opportunities for new applications of the spectroscopic ellipsometry in which the compactness, the simplicity and the rapid response are extremely important. For example, it was integrated into the deposition tool and successfully measured thin films in the vacuum chamber.
This paper describes the principle, system configuration and our innovative efforts on developing the compact high-speed spectroscopic ellipsometer. Some typical application data will be also introduced, such as in line and in situ measurements for photovoltaic, flat panel display and semiconductor industries.