AVS 58th Annual International Symposium and Exhibition
    Spectroscopic Ellipsometry Focus Topic Friday Sessions
       Session EL+AS+EM+MS+PS+TF-FrM

Invited Paper EL+AS+EM+MS+PS+TF-FrM1
Current Trends and Future Outlook for Spectroscopic Ellipsometry

Friday, November 4, 2011, 8:20 am, Room 209

Session: Spectroscopic Ellipsometry: Future Directions and New Techniques
Presenter: James Hilfiker, J.A. Woollam Co., Inc.
Authors: J.N. Hilfiker, J.A. Woollam Co., Inc.
B. Johs, J.A. Woollam Co., Inc.
C.M. Herzinger, J.A. Woollam Co., Inc.
T.E. Tiwald, J.A. Woollam Co., Inc.
Correspondent: Click to Email

This talk reviews the significant developments in spectroscopic ellipsometry (SE) in areas including extending spectral range, improving accuracy, and enhancing speed. Current SE applications owe much to hardware and software developments of the past. Thus, today’s research efforts may reach full potential for applications years or even decades from now. With this in mind, we point to the current state-of-the-art and what this may mean for future SE applications.

Three important areas will be explored. First, there has been a continual trend to expand SE wavelength range. This has included extensions to both shorter and longer wavelengths. For the latter, there is current development into the THz. More immediate benefit may come from smaller SE extensions from the ultraviolet to the near infrared. For example, further near-infrared extensions help to characterize modern transparent conductive oxides (TCOs), used in both inorganic and organic photovoltaic stacks.

Second, we look at the search for improved SE accuracy. Substantial improvements have come with the development of new ellipsometer technologies, progressing from rotating analyzer/polarizer to rotating compensator and now dual-rotating compensator ellipsometers. In addition to improved accuracy, this technology provides advanced measurements, including the complete Mueller-matrix. This will open SE characterization to new applications of anisotropic, nanostructured, and even patterned thin films. Accuracy enhancements must be compatible with the expanding SE spectral range. Infrared SE has overcome many non-ideal optical components to provide measurements competitive to standard FTIR measurements.

Third, we look at the quest for improved measurement speed. This development is constrained by the previous requirements. The benefits of a wide spectral range generally outweigh speed requirements; otherwise laser-based ellipsometry would still have a strong foot-hold. Thus, compromises are made depending on application. Current instrumentation typically utilizes detector arrays for multi-channel SE measurements.

To conclude, we will look at the SE outlook and how it may take advantage of wavelength range, accuracy, and speed. In-line and in-situ SE measurements show special promise. Significant improvements in instrumentation, computing speed, and software are now making these applications more feasible. In addition, there are novel ideas to provide sample access and overcome non-ideal measurement conditions for in-line and in-situ SE. Significant progress in many different areas promises to extend ellipsometry into new areas – many of which are being studied by researchers today.