AVS 58th Annual International Symposium and Exhibition
    Applied Surface Science Division Tuesday Sessions
       Session AS-TuP

Paper AS-TuP11
Microphase Separation of Various Diblock Copolymers Investigated by TOF-SIMS Depth Profiling

Tuesday, November 1, 2011, 6:00 pm, Room East Exhibit Hall

Session: Applied Surface Science Poster Session
Presenter: Yeonhee Lee, Korea Institute of Science and Technology, Republic of Korea
Authors: Y. Lee, Korea Institute of Science and Technology, Republic of Korea
J. Lee, Korea University
W.C. Lim, Korea Institute of Science and Technology
K. Shin, Sogang University, Korea
K.-J. Kim, Korea University
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Diblock copolymers, composed of two distinct homopolymers covalently bonded together at one end, exhibit a microphase separation from a disordered state to an ordered state on cooling or heating. The microphase separation of diblock copolymers has been investigated by many different research groups for many years, because of the increasing use of diblock copolymers as compatibilizers, dispersants, impact modifiers, nanocarriers, and templates. Investigation of the phase behaviour of a family of diblock copolymers between styrene and a homologous series of methacrylates or acrylates has revealed that significantly different phase behaviours are seen for these materials, depending on the temperature, molecular weight, and alkyl side chain length. In this work, we characterized the morphology from various diblock copolymers of poly(styrene-b-alkyl acrylate)(PS-PAA), where PS block was perdeuterated, near the copolymer/air and copolymer/substrate interfaces and in the bulk using time-of-flight Secondary Ion Mass Spectrometry (TOF-SIMS). TOF-SIMS Depth profiling was obtained for the lamellar morphology of PdS-PAA which is found to orient parallel to the surface of the substrate. This preferential orientation resulted in a periodic variation in the composition of each block that continued through the entire copolymer film. Temperature- and chain length-dependent annealing studies on PdS-PAA thin films on the silicon substrates were performed to investigate the order-to-disorder transition (ODT) properties of diblock copolymers.