AVS 57th International Symposium & Exhibition | |
Applied Surface Science | Tuesday Sessions |
Session AS-TuP |
Session: | Applied Surface Science Poster Session |
Presenter: | Z.H. Zhu, Pacific Northwest National Laboratory |
Authors: | Z.H. Zhu, Pacific Northwest National Laboratory V. Shutthanandan, Pacific Northwest National Laboratory |
Correspondent: | Click to Email |
Depth profiling is one of the important applications of time-of-flight secondary ion mass spectrometry (ToF-SIMS). Dual beam depth profiling strategy is commonly used because the current of the primary ion beam is normally very weak (~10-12 A), and the second beam with high current (10-8-10-6 A) is introduced for sputtering. Recent years, a major development in ToF-SIMS field is application of cluster primary ions. It has been found that cluster primary ions can dramatically enhance signal intensity of molecular ions with a factor of 10-1000. So far, cluster primary ions have been introduced into commercial ToF-SIMS instruments for over five years. However, in presently available commercial ToF-SIMS instruments, the usable currents of cluster primary ion beams are considerably smaller than that of monatomic primary ion beams. More importantly, enhancements using cluster primary ions are not only material-dependent but also ion species-dependent. Therefore, large amounts of experimental data are needed to develop an understanding of how to choose an optimal primary ion for ToF-SIMS depth profiling.