| AVS 56th International Symposium & Exhibition | |
| Vacuum Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | VT-WeM1 Invited Paper Gas Dynamics Aspects of Atomic Layer Deposition S.M. George, University of Colorado at Boulder |
| 8:40am | VT-WeM3 Collimated Gas Beam Analysis for Atomic Layer Epitaxy of Cracked Disilane M.P. Nadesalingam, University of Texas at Dallas, M. Kanouff, Sandia National Laboratories, J. Randall, Zyvex Labs, R.M. Wallace, W.P. Kirk, University of Texas at Dallas |
| 9:00am | VT-WeM4 Decomposition Characteristic of Metal-organic Gases S. Yamashita, Tohoku University, Japan, M. Nagase, K. Ikeda, Fujikin Inc., Japan, M. Kitano, Y. Shirai, T. Ohmi, Tohoku University, Japan |
| 9:20am | VT-WeM5 Numerical Simulation of Rarefied Gas Flows through Short Tubes Driven by a Pressure Drop F. Sharipov, Unuversidade Federal do Parana, Brazil, S. Varoutis, D. Valougeorgis, University of Thessaly, Greece |
| 9:40am | VT-WeM6 Modelling a 25 Stage Turbomolecular Pump with 6 Orders of Compression with DSMC R. Versluis, R. Dorsman, TNO Science and Industry, The Netherlands |
| 10:40am | VT-WeM9 New Spiral Molecular Drag Stage Design for High Compression Ratio, Compact Turbo-Drag Pumps S. Giors, L. Campagna, E. Emelli, Varian S.p.A, Italy |
| 11:00am | VT-WeM10 Numerical Analysis of the Rarefied Gas Flow through a Short Channel into a Vacuum O. Sazhin, Ural State University, Russia |
| 11:20am | VT-WeM11 Effect of Surface Material and Roughness on Conductance of Channel between Parallel Disks at Molecular Flow H. Yoshida, M. Shiro, K. Arai, M. Hirata, H. Akimichi, National Metrology Institute of Japan / AIST, Japan |