| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2+TF-WeM1 Plasma Polymerization of bis-1, 2-(triethoxysilyl) Ethane (BTSE): Interfacial Characterization by ToF-SIMS and XPS A. Batan, Univ. Libre de Bruxelles, Facultés Univ. Notre-Dame de la Paix, Belgium, N. Mine, B. Douhard, Facultés Univ. Notre-Dame de la Paix, Belgium, F. Brusciotti, I. De Graeve, J. Vereecken, Vrije Univ. Brussel, Belgium, M. Wenkin, M. Piens, Coating Research Inst., Belgium, H. Terryn, Vrije Univ. Brussel, Belgium, J.J. Pireaux, Facultés Univ. Notre-Dame de la Paix, Belgium, F. Reniers, Univ. Libre de Bruxelles, Belgium |
| 8:20am | PS2+TF-WeM2 Self-limiting Deposition of Nanolaminates by Pulsed PECVD P.C. Rowlette, C.A. Wolden, Colorado School of Mines |
| 8:40am | PS2+TF-WeM3 Invited Paper Tailoring PECVD Ultra-Low-k Films for Nanoscale Interconnects E.T. Ryan, GLOBALFOUNDRIES, S.M. Gates, S. Cohen, Y. Ostrovski, V. Patel, E. Simonyi, C. Dimitrakopoulos, IBM T.J. Watson Research Center, A. Madan, IBM Microelectronics, G. Dubois, IBM Almaden Research Center, A. Grill, IBM T.J. Watson Research Center |
| 9:20am | PS2+TF-WeM5 Amplitude Modulated Pulse RF Discharges for Producing and Driving Nano-Blocks S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Kyushu University, Japan |
| 9:40am | PS2+TF-WeM6 Plasma Deposition of Platinum-Based Nanocomposite Films as Fuel Cell Electrocatalysts A. Milella, E. Dilonardo, University of Bari, Italy, F. Palumbo, Institute for Inorganic Methodologies and Plasmas (IMIP)- CNR, Italy, S. Martin, CEA-G/ Leti, France, R. d'Agostino, F. Fracassi, University of Bari, Italy |
| 10:40am | PS2+TF-WeM9 Contribution of CN Radicals to the Nitrogen Content of Plasma-Deposited a-CNx Materials J.M. Stillahn, E.R. Fisher, Colorado State University |
| 11:00am | PS2+TF-WeM10 Comparison between a DC Reactive Magnetron Sputtering Discharge in an Ar/NH3 and Ar/H2/N2 Gas Mixture F. Henry, A. Batan, F. Reniers, Université Libre de Bruxelles, Belgium |
| 11:20am | PS2+TF-WeM11 The Application of AC Diode Sputtering for Aluminum Thin Films in Small Apertures D.R. Walters, Argonne National Laboratory |
| 11:40am | PS2+TF-WeM12 3D Plasma Simulations of a High Density Plasma CVD Reactor using VIZGLOW P. Kothnur, R. Kinder, Novellus Systems, Inc., X. Yuan, Esgee Technologies, Inc., L. Raja, The University of Texas at Austin |