AVS 55th International Symposium & Exhibition
    Thin Film Monday Sessions

Session TF-MoA
ALD: Functionalization and Surface Chemistry

Monday, October 20, 2008, 2:00 pm, Room 302
Moderator: R.G. Gordon, Harvard University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF-MoA1
Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces
J.W. Elam, Argonne National Lab., S.T. Christensen, F.A. Rabufetti, Northwestern U., W. Setthapun, B. Lee, Argonne National Lab., Z. Feng, Northwestern U., P.C. Stair, Argonne National Lab. & Northwestern U., C.L. Marshall, Argonne National Lab., K.R. Poeppelmeier, Northwestern U., M.J. Bedzyk, Argonne National Lab. & Northwestern U., M.C. Hersam, Northwestern U.
2:20pm TF-MoA2
Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
W.M.M. Kessels, H.C.M. Knoops, A.J.M. Mackus, S.A.F. Dielissen, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
2:40pm TF-MoA3
Growth Kinetics and Mechanism of Rapid SiO2 ALD Using Tris(tert-Pentoxy)Silanol
S.M. George, B.B. Burton, University of Colorado
3:00pm TF-MoA4
Atomic Layer Deposition of Titanium Dioxide: Reaction Mechanism Studies using In Situ Attenuated Total Reflection Fourier Transform Infrared Spectroscopy
V.R. Rai, S. Agarwal, Colorado School of Mines
3:20pm TF-MoA5
Surface Preparation and Interface Cleaning during HfO2 ALD on GaAs
T. Gougousi, J.C. Hackley, UMBC, J.D. Demaree, Army Research Laboratory
4:00pm TF-MoA7
New Barium, Strontium, and Titanium Precursors for the Deposition of Barium/Strontium-containing and Titanium Nitride Thin Films
Q.M. Wang, D.V. Shenai, Rohm and Haas Electronic Materials LLC, R.G. Gordon, Harvard University
4:20pm TF-MoA8
Ab Initio and FTIR Study of TDMAH and HTB Adsorption and Reaction on Hydrogen-terminated Si Surfaces
K. Li, N. Li, H.C. Turner, T.M. Klein, University of Alabama
4:40pm TF-MoA9
In-situ Quadrupole Mass Spectroscopy Analysis of Low Temperature Cobalt Deposition Reactions using Co2(CO)8 and Co(C5H5)(CO)2 in Atomic Layer Deposition Process Sequencing
S.J. Oh, G.N. Parsons, North Carolina State University
5:00pm TF-MoA10
Reaction Mechanism Studies on ALD and CVD of Cobalt from Dicobalt Hexacarbonyl Tert-Butylacetylene
T.Y. Park, K.W. Lee, J.S. Lee, D.O. Kim, J.S. Lee, H.T. Jeon, Y.D. Won, Hanyang University, Korea Republic
5:20pm TF-MoA11
Excellent Si Surface Passivation Properties of ALD Al2O3 Films Studied by Optical Second-Harmonic Generation
J.J.H. Gielis, B. Hoex, N.M. Terlinden, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands