| AVS 55th International Symposium & Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-MoA1 Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces J.W. Elam, Argonne National Lab., S.T. Christensen, F.A. Rabufetti, Northwestern U., W. Setthapun, B. Lee, Argonne National Lab., Z. Feng, Northwestern U., P.C. Stair, Argonne National Lab. & Northwestern U., C.L. Marshall, Argonne National Lab., K.R. Poeppelmeier, Northwestern U., M.J. Bedzyk, Argonne National Lab. & Northwestern U., M.C. Hersam, Northwestern U. |
| 2:20pm | TF-MoA2 Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films W.M.M. Kessels, H.C.M. Knoops, A.J.M. Mackus, S.A.F. Dielissen, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 2:40pm | TF-MoA3 Growth Kinetics and Mechanism of Rapid SiO2 ALD Using Tris(tert-Pentoxy)Silanol S.M. George, B.B. Burton, University of Colorado |
| 3:00pm | TF-MoA4 Atomic Layer Deposition of Titanium Dioxide: Reaction Mechanism Studies using In Situ Attenuated Total Reflection Fourier Transform Infrared Spectroscopy V.R. Rai, S. Agarwal, Colorado School of Mines |
| 3:20pm | TF-MoA5 Surface Preparation and Interface Cleaning during HfO2 ALD on GaAs T. Gougousi, J.C. Hackley, UMBC, J.D. Demaree, Army Research Laboratory |
| 4:00pm | TF-MoA7 New Barium, Strontium, and Titanium Precursors for the Deposition of Barium/Strontium-containing and Titanium Nitride Thin Films Q.M. Wang, D.V. Shenai, Rohm and Haas Electronic Materials LLC, R.G. Gordon, Harvard University |
| 4:20pm | TF-MoA8 Ab Initio and FTIR Study of TDMAH and HTB Adsorption and Reaction on Hydrogen-terminated Si Surfaces K. Li, N. Li, H.C. Turner, T.M. Klein, University of Alabama |
| 4:40pm | TF-MoA9 In-situ Quadrupole Mass Spectroscopy Analysis of Low Temperature Cobalt Deposition Reactions using Co2(CO)8 and Co(C5H5)(CO)2 in Atomic Layer Deposition Process Sequencing S.J. Oh, G.N. Parsons, North Carolina State University |
| 5:00pm | TF-MoA10 Reaction Mechanism Studies on ALD and CVD of Cobalt from Dicobalt Hexacarbonyl Tert-Butylacetylene T.Y. Park, K.W. Lee, J.S. Lee, D.O. Kim, J.S. Lee, H.T. Jeon, Y.D. Won, Hanyang University, Korea Republic |
| 5:20pm | TF-MoA11 Excellent Si Surface Passivation Properties of ALD Al2O3 Films Studied by Optical Second-Harmonic Generation J.J.H. Gielis, B. Hoex, N.M. Terlinden, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |