AVS 55th International Symposium & Exhibition
    Surface Science Thursday Sessions

Session SS1-ThM
Growth and Etching on Surfaces

Thursday, October 23, 2008, 8:00 am, Room 207
Moderator: A.A. Baski, Virginia Commonwealth University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am SS1-ThM1
Step Etching and Restructuring on Cl2-exposed, Cl-saturated Si(001)-(2x1)
R.E. Butera, J.H. Weaver, University of Illinois at Urbana-Champaign
8:20am SS1-ThM2
Ion Scattering from Au Nanoclusters formed by Buffer Layer Assisted Growth
S. Balaz, J.A. Yarmoff, University of California, Riverside
8:40am SS1-ThM3
Competition Between Particle Formation and Burrowing: Gold on Bismuth
P. Swaminathan, J.S. Palmer, J.H. Weaver, University of Illinois at Urbana-Champaign
9:00am SS1-ThM4
Optical Anisotropy Induced by Oblique Incidence Ion Bombardment of Ag(001)
H. Wormeester, F. Everts, B. Poelsema, University of Twente, The Netherlands
9:20am SS1-ThM5 Invited Paper
Producing Ultraflat Si(100) Surfaces with Aqueous Etching: STM and FTIR Yield Mechanistic Insights
M.A. Hines, Cornell University
10:40am SS1-ThM9
Focused Ion Beam (FIB) Patterning and Selective Decomposition of III-V Semiconductors
K.A. Grossklaus, J.M. Millunchick, University of Michigan
11:00am SS1-ThM10
Electron Induced Deposition of Amorphous Carbon Nitride Films
H. Fairbrother, J.M. Gorham, J.D. Wnuk, Johns Hopkins University
11:20am SS1-ThM11
Low Energy Electron Induced Decomposition of Adsorbed Methylcyclopentadienylplatinum(IV)-trimethyl
J.D. Wnuk, J.M. Gorham, Johns Hopkins University, W.F. Van Dorp, Rutgers, the State University of New Jersey, C.W. Hagen, Delft University of Technology, The Netherlands, T.E. Madey, Rutgers, the State University of New Jersey, D.H. Fairbrother, Johns Hopkins University
11:40am SS1-ThM12
A Study of the Surface Chemistry and Cross Sections for Electron Induced Dissociation using Temperature Programmed Desorption
W.F. Van Dorp, Delft University of Technology, The Netherlands, S. Zalkind, B. Yakshinksiy, T.E. Madey, Rutgers, the State University of New Jersey, J.D. Wnuk, J.M. Gorham, H. Fairbrother, Johns Hopkins University, C.W. Hagen, Delft University of Technology, The Netherlands