| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-ThA1 Invited Paper High Quality Thin Films Deposited at Low Temperatures by Plasma Enhanced ALD and CVD Techniques C.J. Hodson, O. Thomas, Q. Fang, Oxford Instruments, UK |
| 2:40pm | PS2-ThA3 An Analysis of the Deposition Mechanisms Involved During Self-limiting Growth of Metal Oxides by Pulsed PECVD M.T. Seman, CMD Research LLC, D.N. Richards, C.A. Wolden, Colorado School of Mines |
| 3:00pm | PS2-ThA4 Self-Limiting Growth of Titania by Pulsed Plasma-Enhanced Chemical Vapor Deposition N.G. Kubala, C.A. Wolden, Colorado School of Mines |
| 3:20pm | PS2-ThA5 Capillary Jet Injection of SiH4 in the HDP-PECVD of SiO2: What We Can Learn from It R. Botha, T. Novikova, P. Bulkin, LPICM, Ecole Polytechnique, France |
| 4:00pm | PS2-ThA7 High Quality TEOS Oxide Film CVD by Microwave RLSA Plasma H. Ueda, Y. Tanaka, Y. Ohsawa, T. Nozawa, Tokyo Electron Technology Development Institute, INC., Japan |
| 4:20pm | PS2-ThA8 Plasma Polymerization on Textiles: Deposition of Functional Nanostructured Thin Films S. Guimond, Y. Geng, A. Ritter, B. Hanselmann, D. Hegemann, EMPA, Switzerland |
| 4:40pm | PS2-ThA9 Stable Super Hydrophobic Nanocoatings on Polymers Prepared by Gas Phase Deposition M. Puttaswamy, University of Aarhus, Denmark, K.B. Haugshoj, L. Christensen, Danish Technology Institute, Denmark, P. Kingshott, University of Aarhus, Denmark |
| 5:00pm | PS2-ThA10 Tunable Properties of Plasma-Polymerized Organosilicones V. Cech, Brno University of Technology, Czech Republic |
| 5:20pm | PS2-ThA11 Plasma Deposited Films Containing Platinum Nanoclusters as Catalysts for Fuel Cells A. Milella, E. Dilonardo, F. Palumbo, R. d'Agostino, F. Fracassi, Università degli Studi di Bari, Italy |