| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | NS+NC-ThA1 Invited Paper Pattern Error Correction and Density Multiplication by Lithographically Guided Self Assembly R. Ruiz, E.A. Dobisz, D.S. Kercher, T.R. Albrecht, Hitachi Global Storage Technologies Inc., H. Kang, F.A. Detcheverry, J.J. de Pablo, P.F. Nealey, University of Wisconsin |
| 2:40pm | NS+NC-ThA3 Patterning Self-Assembled Monolayers of Thiols Down to the sub-10 nm Scale by Scanning Tunneling Microscopy C. Shen, M. Buck, University of St. Andrews, UK |
| 3:00pm | NS+NC-ThA4 A Novel Nanolithography Technique for Formation of Uniform Nanostructures W. Wu, D. Dey, O. Memis, A. Katsnelson, H. Mohseni, Northwestern University |
| 3:20pm | NS+NC-ThA5 Fabrication of Large Area Glass Submicron Pattern by Multibeam Interference Lithography and Reactive Ion Etching H.S. Jee, University at Buffalo, A.P. Zhang, Zhejiang University, China, R. Burzynski, Laser Photonics Technology Inc., K.T. Kim, P.N. Prasad, Y.K. Yoon, University at Buffalo |
| 4:00pm | NS+NC-ThA7 Invited Paper STM Atom and Molecule Manipulation: Realizing Single Molecule Switches and Devices S.-W. Hla, Ohio University |
| 4:40pm | NS+NC-ThA9 Nanopatterning of Functional Polymers by Thermal Dip-Pen Nanolithography W.K. Lee, Naval Research Laboratory, W.P. King, University of Illinois, Urbana-Champaign, L.J. Whitman, National Institute of Standards and Technology, P.E. Sheehan, Naval Research Laboratory |
| 5:00pm | NS+NC-ThA10 Selective Assembly of DNA-Templated Nanostructures for the Application to Nano-Device H.J. Kim, Y. Roh, B. Hong, Sungkyunkwan University, Korea |
| 5:20pm | NS+NC-ThA11 High Resolution STM Imaging and Manipulation of Multi-decker Porphyrin H. Tanaka, Osaka University, Japan, T. Ikeda, Kyushu University, Japan, M. Takeuchi, NIMS, Japan, S. Shinkai, Kyushu University, Japan, T. Kawai, Osaka University, Japan |