| AVS 55th International Symposium & Exhibition | |
| Vacuum Technology | Tuesday Sessions |
| Session VT-TuA |
| Session: | Vacuum Gauging and Calibration |
| Presenter: | M. Wüest, INFICON Ltd, Balzers, Liechtenstein |
| Authors: | M. Wüest, INFICON Ltd, Balzers, Liechtenstein V. Kolobov, CFD Research Corporation A. Vasenkov, CFD Research Corporation |
| Correspondent: | Click to Email |
Industrial vacuum processes such as chemical vapor deposition (CVD) can affect the long-term stability of vacuum gauges. This sensor drift can be caused by deposition of process by-products on the surfaces of the sensor. Here, we present chemically reactive gas dynamics inside capacitance diaphragm gauges (CDG) in a CVD process. We present modeling results for the formation and deposition of process by-products in gauges with different geometries.