AVS 55th International Symposium & Exhibition
    Thin Film Tuesday Sessions
       Session TF-TuA

Paper TF-TuA10
Increasing the Glass Cracking Resistance by Atomic Layer Deposition

Tuesday, October 21, 2008, 4:40 pm, Room 302

Session: Applications of ALD II
Presenter: M. Putkonen, Beneq Oy, Finland
Authors: M. Putkonen, Beneq Oy, Finland
P. Soininen, Beneq Oy, Finland
M. Rajala, Beneq Oy, Finland
T. Mäntylä, Tampere University of Technology, Finland
Correspondent: Click to Email

Infrared cut-off filters are used in CCD or CMOS sensors. Typically these filters are made onto separate glass sheets placed in front of the sensor. However, recently thinner and thinner glasses are used, for example in the wafer-scale integration, which causes increasing problems due to the cracking of the substrates. Cracking of the glass due to the nanometer-scale Griffith-like flaws1 is well known problem. These tiny flaws are usually in the range of 10-20 nm at the surface and they act as a starting point where bigger cracks start to develop. There are some available strenghtening approaches, based for example on the coatings made by solution methods.2 However, these relative thick coatings may require high post annealing temperatures in order to obtain desired properties without sacrificing optical properties. In this study we introduce ALD technique for improving the crack resistance of the glass. Previously ALD has been employed for example for thin film deposition onto deep microelectronic trenches as well as for coating nanometer scale features. Since ALD is highly conformal surface-controlled coating method, it is expected that the film growth will closely follow the structural flaws of the glass surface. We have utilised TMA/H2O and SAM24/O3 processes and studied the mechanical and optical properties of films. For example, thin films were deposited onto soda lime and D263T glass substrates measuring from 20x50 mm2 to 1200x1200 mm2. Typical film thicknesses were in the range of 10-30 nm, but thicker coatings were also evaluated. Batches of smaller pieces (20x50 - 100x100 mm2) were deposited in Beneq TFS 500 ALD system whereas bigger samples were evaluated in P400A, P800 and TFS 1200 systems. Depending on the sample size, glass thicknesses from 0.3 to 3 mm were evaluated. ALD processing of large area glass sheets were evaluated in terms of film uniformity and optical properties. Glass strength was evaluated against different thin film processing conditions and film thickness. According to the four point bending tests significant improvement on cracking strength were obtained by using ALD coatings.

1 A. Griffith, The phenomena of rupture and flow in solids, Phil. Trans. Royal Soc., A221 (1920) 163.
2 K. Endres et. al., Enhancement of fracture strength of cutted plate glass by the application of SiO2 sol-gel coatings, Thin Solid Films 351 (1999) 132.