AVS 55th International Symposium & Exhibition | |
Nanomanufacturing Focus Topic | Thursday Sessions |
Session NM+EM+PS+NS+NC-ThM |
Session: | Printable Lithography and Processing |
Presenter: | J.M. Millunchick, University of Michigan |
Authors: | I. Eu, University of Michigan L. Musinski, University of Michigan T. Liu, University of Michigan D. Morris, ElectroDynamic Applications, Inc. J.M. Millunchick, University of Michigan B. Gilchrist, University of Michigan A.D. Gallimore, University of Michigan |
Correspondent: | Click to Email |
We have developed a particle accelerator that electro-statically charges nanometer- to micron-sized conductive particles that are then accelerated through grids with bias voltages up to roughly 10kV, allowing for the deposition of particles without using a carrier solution or “ink”. By carefully controlling the energy of the particles, various regimes of materials processing may be achieved. For example, high energy high mass particles are expected to etch a substrate, while decreasing either the mass or velocity will result in deposition of the particles. A prototype device has been fabricated based on transporting the particles to and through an ultrafine “sieve” via back pressure and acoustic and/or mechanical vibration. The pressure and vibration moves the particles through the sieve apertures, allowing for electrostatic acceleration of the particles one at a time for maximum impulse. The experimental data shows a roughly Gaussian distribution of 50 micron Ag-coated glass spheres extracted at a mean electric field of about 1.9 MV/m with a standard deviation of approximately 0.4 MV/m. The data agrees well with the analytical model for required extraction fields determined using calculated Van der Waal’s forces and a Lipshitz constant of 0.6 eV. The variance likely attributable to electrode surface roughness and manufacturing imperfections in particle shape. Initial feasibility tests have been conducted in which this system has been used to impact aluminum spheres of size 5-20 microns on glass slides. Scanning Electron Micrographs show that at a charging field of approximately 1.3 MV/m and an acceleration voltage of roughly 10kV, the glass slides are uniformly coated with individually isolated Al particles. The particle isolation and deposition control implies the potential for very high vertical and horizontal resolution in target applications. Now that the proof of concept has been established, we are scaling down the technology so that submicron particles may be deposited, with the long-term goal to deposit individual particles on the order of tens of nanometers.