AVS 55th International Symposium & Exhibition
    Nanomanufacturing Focus Topic Thursday Sessions
       Session NM+EM+PS+NS+NC-ThM

Paper NM+EM+PS+NS+NC-ThM5
Fabrication of Microarrays with Nanoscale Chemical Contrast by Nanoimprint-Assisted Lift-Off

Thursday, October 23, 2008, 9:20 am, Room 309

Session: Printable Lithography and Processing
Presenter: A. Ruiz, JRC, European Commission
Authors: A. Ruiz, JRC, European Commission
C.A. Mills, Inst. for Bioeng. of Catalonia, Barcelona Sci. Park
A. Valsesia, JRC, European Commission
E. Martinez, Inst. for Bioeng. of Catalonia, Barcelona Sci. Park
P. Colpo, JRC, European Commission
J. Samitier, Inst. for Bioeng. of Catalonia, Barcelona Sci. Park
F. Rossi, JRC, European Commission
Correspondent: Click to Email

The fabrication of ordered microstructures of colloidal crystals is increasingly attracting interest due to their potential applications as sensing, optical and photonic band-gap materials. Depending on the application (i.e. chemical or biochemical sensors, photonic chips), specific microstructured configurations of the colloidal crystal are needed. Most of the methodologies reported so far for the production of colloidal crystals are based on the directed self-assembly of micro or nanospheres, in which patterning and formation take place simultaneously in a template created beforehand, normally by the modification of the surface chemical or topographic properties. However, methods for patterning the colloidal film after it has been formed are scarce. The interest in such methods lies in the fact that they allow fine control over the microstructure of the colloidal film by selective removal of a single layer of close-packed nanospheres. Recent top-down approaches to the micropatterning of nano-beads are based on soft lithography lift-off processes using PDMS stamps. Removal of nano-beads strongly adhering to the substrate is however hard to realize and limitations related to the PDMS structural properties, i.e. deformation, appear. Normally, the beads have to be loosely attached so that bead transfer or removal is not inhibited. In this work, a new soft-lithographic method for micro-patterning nano-bead arrays, based on structured poly(methyl methacrylate) (PMMA) and using a nanoimprinter apparatus, is described. The properties of the PMMA, with respect to hardness and flexibility, are promising for resolving sub-micron patterns of nanoparticles. The use of the nanoimprinter allows careful control of the temperature and pressure during the contact-stripping operation; this ensures accurate removal of nanoparticles over large areas even when they are strongly attached to the substrate. Patterns of polystyrene nano-beads in several micro-scale configurations have been obtained using beads of different diameters (100 ~ 500 nm) and with different levels of adherence to the substrate. The micropatterning of nanobeads thus achieved has been then used to create surfaces with nanoscale chemical contrast inside the micro-patterns. Having structured regions separated by flat, unstructured regions is advantageous for many applications, such as sensing platforms for parallel detection or cell culture platforms for examining cell-surface interactions at the nanoscale.