| AVS 55th International Symposium & Exhibition | |
| Manufacturing Science and Technology | Monday Sessions |
| Session MS+NC-MoM |
| Session: | CMOS Extension and Metrology |
| Presenter: | J. Fu, National Institute of Standards and Technology |
| Authors: | J. Fu, National Institute of Standards and Technology W. Chu, Harbin Institute of Technology, China T. Vorburger, National Institute of Standards and Technology |
| Correspondent: | Click to Email |
As the technology progresses, the control of the thermal and vibrational environment for experiments is also becoming more sophisticated. In particular, temperature control to within ± 0.25° C for a general purpose lab is fairly common place. However, even with such a stringent temperature control specification, the variation of temperature can be observed in the AFM (atomic force microscopy) images of a straight edge. In this paper we show the correlation between edge distortion of a semiconductor linewidth standard and the thermal recycling in the lab imposed by a two-level infrastructural temperature control system. A Fast Fourier Transform (FFT) analysis of the AFM images of the line links the frequency of the waviness at the line edge to the damper and reheating coil of the air conditioning feedback system. The unique frequency components present in all three axes of AFM images lead us to conclude that the temperature variation affected the PZT scanner which affected the measurements.