Paper EW-WeL3
XPS Sputter Depth Profiling and Surface Cleaning with C60 Sputter Ion Beams

Wednesday, October 22, 2008, 1:20 pm, Room Exhibit Hall

C60 sputtering has emerged as a standard method for XPS depth profiling of polymer, organic, and biomaterial thin films. Several years of exploratory use of C60 ions for sputter cleaning and depth profiling has shown C60 sputter cleaning can be successfully applied to a very broad range of materials with good success and that C60 depth profiling, while not universally applicable, has been successfully used to study a number of important and commonly used materials systems. We will present an overview of our experience with C60 sputtering as it relates to XPS and highlight the strengths and limitations of this new surface characterization method. Experimental results from inorganic, polymer, and biomaterials will be presented to illustrate the application potential for XPS and C60 sputtering.