AVS 55th International Symposium & Exhibition
    Exhibitor Workshops Wednesday Sessions
       Session EW-WeL

Paper EW-WeL1
Characterization and Optimization of Polyatomic Ions for XPS Depth Profiling of Organic Materials

Wednesday, October 22, 2008, 12:40 pm, Room Exhibit Hall

Session: Exhibitor Workshops
Presenter: C.J. Blomfield, Kratos Analytical Ltd, UK
Authors: C.J. Blomfield, Kratos Analytical Ltd, UK
S.C. Page, Kratos Analytical Ltd, UK
D.J. Surman, Kratos Analytical Ltd, UK
S.J. Hutton, Kratos Analytical Ltd, UK
A.J. Roberts, Kratos Analytical Ltd, UK
S.J. Coultas, Kratos Analytical Ltd, UK
Correspondent: Click to Email

X-ray Photoelectron Spectroscopy (XPS) depth profiling of inorganic materials has become a standard analytical technique. Results can be obtained relatively quickly with good interface resolution while maintaining chemical information. It has become desirable to achieve the same performance on organic materials however there are several well known problems associated with sputter depth profiling which has limited the application. In recent years there has been significant development in the TOF-SIMS community of the use is polyatomic ion sources and in particular C60 for the generation of molecular species from organic materials. This use of C60 has been extended to XPS depth profiling and for some materials has shown good promise. This paper discusses the characterization and optimization of other polyatomic species in addition to C60 that are also showing considerable promise for XPS depth profiling of organic materials.