AVS 55th International Symposium & Exhibition
    Electronic Materials and Processing Thursday Sessions
       Session EM+NC-ThM

Paper EM+NC-ThM3
Point-probe Tunneling Measurements of Sheet Conductance of Metallized Silicon Surfaces

Thursday, October 23, 2008, 8:40 am, Room 210

Session: Contacts, Interfaces, and Defects in Semiconductors
Presenter: H. Won, The Pennsylvania State University
Authors: H. Won, The Pennsylvania State University
R.F. Willis, The Pennsylvania State University
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We report measurements of the sheet conductance of Si(111) 7x7 reconstructed surface and its metallization with Ag-overlayer. The experiment employs a STM-tip point tunneling probe coupled to a second spring-contact electrode to evaluate charge-carrier injection and transport via surface states prepared in-situ in UHV. The measurements distinguish a surface-states contribution, a Schottky diode contribution, and a metallic-overlayers dependence on thickness, ranging from submonolayer coverage to 10 monolayers. The thin film conductance shows a dependence on the interface conductance of the semiconductor, which is a function of the surface electron density.