| AVS 55th International Symposium & Exhibition | |
| Applied Surface Science | Wednesday Sessions |
| Session AS-WeM |
| Session: | Advanced Data Analysis for Surface Characterization |
| Presenter: | J.A. Ohlhausen, Sandia National Laboratories |
| Authors: | J.A. Ohlhausen, Sandia National Laboratories M.R. Keenan, Sandia National Laboratories |
| Correspondent: | Click to Email |
Time-of-Flight Secondary Ion Mass Spectrometry is used to analyze surfaces and surface volumes of many kinds of materials. Many times the surfaces are rough in texture and contain variable materials compositions, thus affecting secondary ion responses. Data interpretation can be influenced unknowingly by topographical differences that might be present. In 3D analysis, data are typically represented as idealized cubes. Actual data will vary from the ideal cube in some unknown way. Spatial distortion from the idealized cube can be caused by several events including starting topography and differential sputtering rates. By understanding morphological and sputtering deviations, a 3D profile can be adjusted to reflect the actual shape of the removed volume. Strategies for measuring topographies and correcting images for 2D and 3D analysis will be presented. Pitfalls and shortcomings will be discussed.
Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy’s National Nuclear Security Administration under contract DE-AC04-94AL85000.