| AVS 55th International Symposium & Exhibition | |
| Applied Surface Science | Tuesday Sessions |
| Session AS-TuM |
| Session: | Use of Cluster Ion Beams for Surface Analysis |
| Presenter: | S.J. Hutton, Kratos Analytical Ltd, UK |
| Authors: | S.J. Hutton, Kratos Analytical Ltd, UK I.W. Drummond, Kratos Analytical Ltd, UK S.C. Page, Kratos Analytical Ltd, UK |
| Correspondent: | Click to Email |
Since the advent of small analysis area (sub millimetre) X-ray photoelectron spectroscopy (XPS) sputter depth profiling has become a standard technique for the characterisation of inorganic materials. Results are produced relatively quickly, interface resolution of multilayer samples is generally good and chemical information can be obtained. Similar XPS sputter depth profiling performance on organic materials is desirable, however, there are several well known problems associated with sputter depth profiling which limit the applicability of this technique to these materials. Some of the most intractable issues are the ion beam induced chemistry often observed during sputtering of polymers and variations in etch rate. The time-of-flight secondary ion mass spectroscopy (TOF-SIMS) community has led the way in addressing these limitations by the use of cluster ion sources. Cluster ions provide a significant increase in secondary ion yield over conventional mono-atomic sources.1,2 A further significant benefit from this type of source is a reduction in beam induced damage of materials as measured by SIMS.3 Recently the use of a C60 cluster ion source has been extended to XPS depth profiling.4,5The use of this cluster ion source has been shown to also significantly reduce the surface chemical damage of some organic materials during XPS sputter cleaning of materials.4 This study compares the application of different cluster ion sources for XPS sputter depth profiling of several organic materials.
1D. Weibel, S. Wong, N. Lockyer, P. Blenkinsopp, R. Hill, J. Vickerman, Anal. Chem. 75 (7), 1754-1764, 2003.
2C. Szakal, S. Sun, A. Wucher and N. Winograd, Applied Surface Science, 231-232, 183-185, 2004
3R. Möllers, N. Tuccitto, V. Torrisi, E. Niehuisa and A. Licciardello, Applied Surface Science, 252 (19), 6509-6512, 2006.
4N. Sanada, A. Yamamoto, R. Oiwa, Y. Ohashi, Surf. Int. Anal. 36 (3), 280-282, 2004.
5Ying-Yu Chen, Bang-Ying Yu, Wei-Ben Wang, Mao-Feng Hsu, Wei-Chun Lin, Yu-Chin Lin, Jwo-Huei Jou, and Jing-Jong Shyue, Anal. Chem., 80 (2), 501-505, 2008.